Laplace horizontal plasma enhanced atomic layer deposition horizontal coating system PEALD LAD400/04
Laplace horizontal plasma enhanced atomic layer deposition horizontal coating system PEALD LAD400/04

Laplace's latest plasma-enhanced atomic layer deposition horizontal coating system can be applied to various high-efficiency solar cell AlOx and various functional thin film growth processes, and is the core process equipment of various solar cells.

You can consult through the following phone or email
Sales E-mail:sales@laplace-tech.cn
Contact Number:0755-28329695 (曲先生)
  • Product Description
  • Data and Pictures

Application characteristics


The device is horizontally placed, suitable for the production of 210mm large silicon wafers, without card printing, scratches, and can help customers improve battery efficiency and yield.。


拉普拉斯等离子体增强原子层沉积水平镀膜系统 LAD400/04


拉普拉斯等离子体增强原子层沉积水平镀膜系统 LAD400/04


拉普拉斯等离子体增强原子层沉积水平镀膜系统 LAD400/04


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