Laplace plasma enhanced chemical vapor deposition horizontal coating system PECVD VEGA LVG400/0X
Laplace plasma enhanced chemical vapor deposition horizontal coating system PECVD VEGA LVG400/0X

Laplace's latest plasma enhanced chemical vapor deposition horizontal coating system can be applied to various high-efficiency battery AlOx and SiNx growth processes, and is the core process equipment for the production and development of various solar cells。

You can consult through the following phone or email
Sales E-mail:sales@laplace-tech.cn
Contact Number:0755-28329695 (曲先生)
  • Product Description
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Application characteristics


This equipment integrates various coating processes such as SiO2, SiC, AlOx and SiNx, which can help customers reduce fixed assets investment and improve battery yield. The device is horizontally placed, suitable for the production of 210mm large silicon wafers, without card printing, scratches, and can help customers improve battery efficiency and yield.


拉普拉斯等离子体增强化学气相沉积水平镀膜系统 LVG400/2

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