Laplace Plasma Enhanced Chemical Vapor Deposition System  PECVD Twin LPE430/10
Laplace Plasma Enhanced Chemical Vapor Deposition System PECVD Twin LPE430/10

Laplace's latest plasma enhanced chemical vapor deposition horizontal coating system can be applied to various high-efficiency battery AlOx and SiNx growth processes, and is the core process equipment for the production and development of various solar cells。

You can consult through the following phone or email
Sales E-mail:sales@laplace-tech.cn
Contact Number:0755-28329695 (曲先生)
  • Product Description
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Application characteristics:


This equipment integrates various coating processes such as SiO2, SiC, AlOx and SiNx, which can help customers reduce fixed assets investment and improve battery yield. This equipment is suitable for 156-210mm silicon wafer production and has the highest production capacity in the industry, which can help customers reduce fixed asset investment and operating costs.


拉普拉斯等离子体增强化学气相沉积镀膜系统 LPE410/10

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