Laplace Low Pressure Horizontal Chemical Vapor Deposition System  LPCVD LLP370/05
Laplace Low Pressure Horizontal Chemical Vapor Deposition System LPCVD LLP370/05

Laplace's latest low-pressure horizontal chemical vapor deposition coating system can be applied to the tunnel oxide layer and amorphous silicon growth process of N-TOPCon batteries, and is the core process equipment for the next generation of high-efficiency N-TOPCon batteries.

You can consult through the following phone or email
Sales E-mail:sales@laplace-tech.cn
Contact Number:0755-28329695 (曲先生)
  • Product Description
  • Data and Pictures

Application characteristics


This equipment is suitable for the production of 156-210mm silicon wafers. It has a higher coating uniformity than conventional vertical inserts, which can help customers improve the efficiency, concentration, and EL yield of high-efficiency solar cells. This equipment has the highest production capacity in the industry and can help customers reduce fixed asset investment and operating costs.


1. Put the film horizontally, the utilization of the space in the tube is high, with low energy consumption and the highest production capacity in the industry

2. The direction of the silicon wafer is consistent with the direction of the airflow, the silicon wafer has a small obstruction to the airflow, and the uniformity between the chip and the chip is better;

3. Self-weight extrusion, reduce the gap between silicon wafers, controllable winding diffussion/winding plating;

4. Horizontal placement of wafers is more suitable for the production of super-large and ultra-thin silicon wafers;

5. The battery technology has high applicability and versatility, and can be used in various battery structures such as PERC and TOPCon;

6. The modular design of the whole machine has good compatibility and can be upgraded and converted with each other;


拉普拉斯低压水平化学气相沉积镀膜系统  LLP370/05

Related Recommend

Laplace Reduced Pressure Horizontal Phosphorus Diffusion System  LRP370/05
Laplace Reduced Pressure Horizontal Phosphorus Dif...
Laplace Reduced Pressure Horizontal Boron Diffusion System  LRP370/05
Laplace Reduced Pressure Horizontal Boron Diffusio...
Laplace Reduced Pressure Horizontal Oxidation/Annealing System LOX370/05
Laplace Reduced Pressure Horizontal Oxidation/Anne...
Laplace Low Pressure Horizontal Chemical Vapor Deposition System  LPCVD LLP370/05
Laplace Low Pressure Horizontal Chemical Vapor Dep...