LAPLACE Renewable Energy Technology Co., Ltd.
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Laplace focuses on photovoltaic core technology and testing and analysis equipment, and constantly promotes the localization of high-end equipment and the transformation and upgrading of the photovoltaic industry.
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Laplace originated from semiconductors and is committed to becoming a leading brand in the field of high-end domestic semiconductor equipment.
The development of core components is the only way for localization of high-end equipment and intelligent manufacturing in China, as well as the foundation and core competitiveness of Laplace's high-quality development.
Laplace will continue to be committed to leading the development of high-end manufacturing equipment, advanced tools and composite materials in the world.
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Item
High temperature oxidation furnace
Functions
• Used in high temperature oxidation processes of SiC and GaN
• Meet the vacuum/atmosphere high temperature oxidation process
Important parameters
• Maximum wafer size: meet the requirements of wafer process below 6 inches
• Maximum loading capacity: 50 slides/batch
• Maximum heating temperature: 1500℃
Loading and unloading method
• Vertical vertical lift
• Vertical vacuum sealing system
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