ALD Pindola™ series PiAX150  for silicon-based semiconductor devices
ALD Pindola™ series PiAX150 for silicon-based semiconductor devices
You can consult through the following phone or email
Sales E-mail:sales@laplace-tech.cn
  • Product Description
  • Data and Pictures


Item

ALD

Functions

•  Ultra-thin films for semiconductor applications: Al2O3, HfO2, ZrO2, TiO2, SrTiO3, etc.

Important parameters

•  Wafer size 8 inches

•  Temperature range 25°C ~ 500°C 

•  The number of precursors can be selected in three or six ways

•  Process chamber cleanliness level 100

Film thickness uniformity

•  ≤2%



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