Oxidation system Pindola ™ series POX300 furnace for silicon-based semiconductor devices
Oxidation system Pindola ™ series POX300 furnace for silicon-based semiconductor devices
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Sales E-mail:sales@laplace-tech.cn
Contact Number:0755-28329695 (曲先生)
  • Product Description
  • Data and Pictures


Technical Parameters:

    1.  High-precision temperature control technology can meet the high temperature process of 1200℃

    2.  Special gas pipeline design to ensure high cleanliness of the process tube

    3.  The unique thermal field design with low-stress filament and vacuum pouring heat insulation, adaptive cascade temperature control system, ensure high-precision temperature control in the constant temperature zone

    4.  Advanced particle control technology

    5.  Increase the closed-loop pressure control technology of the process chamber to ensure the uniformity of the process effect

    6.  Stable transmission system and process module design, compatible with multiple process requirements


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