LAPLACE Renewable Energy Technology Co., Ltd.
Energy
Chinese
English
French
Laplace focuses on photovoltaic core technology and testing and analysis equipment, and constantly promotes the localization of high-end equipment and the transformation and upgrading of the photovoltaic industry.
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Laplace originated from semiconductors and is committed to becoming a leading brand in the field of high-end domestic semiconductor equipment.
The development of core components is the only way for localization of high-end equipment and intelligent manufacturing in China, as well as the foundation and core competitiveness of Laplace's high-quality development.
Laplace will continue to be committed to leading the development of high-end manufacturing equipment, advanced tools and composite materials in the world.
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Model
LPCVD(PLX300)
Funcitons
• For growth of thin film materials: silicon dioxide(SiO2), silicon nitride(Si3N4), polysilicon, oxygen-doped polysilicon, phosphorus-doped polysilicon, boron-doped polysilicon, graphene, carbon nanotubes
• LTO、TEOS、Si3N4、LP-POLY、BPSG
parameters
• Wafer size 2~8 inch
• Loading 1~5 tubes
• Temperature control accuracy of constant temperature zone
• Single point temperature stability
uniformity
• TEOS thin film：≤2％ within wafer，≤2％ between wafers，≤2％ between batchs
• POLY ：≤3％ within wafer，≤3％ between wafers，≤3％ between batchs
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